/*---------------------------------------------------------------------------*\
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Copyright (C) 2021 OpenCFD Ltd.
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License
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Class
Foam::electrostaticDepositionFvPatchScalarField
Group
grpGenericBoundaryConditions
Description
The \c electrostaticDeposition is a boundary condition to
calculate electric potential (\c V) on a given boundary
based on film thickness (\c h) and film resistance (\c R) fields
which are updated based on a given patch-normal current density
field (\c jn), Coulombic efficiency and film resistivity.
\f[
j_n = - \sigma \nabla^\perp_p V = - \sigma (\vec{n}\cdot(\nabla V)_p)
\f]
\f[
\frac{dh}{dt} = C_{eff} (j_n - j_{min})
\f]
\f[
\frac{dR}{dt} = \rho \frac{dh}{dt} = \rho C_{eff} (j_n - j_{min})
\f]
\f[
V_{film}^n = V_{film}^o + j_n R_\Delta
\f]
\f[
V_{body} = j_n R_{body}
\f]
\f[
V_p^n = V_i + V_{body} + V_{film}^n
\f]
where
\vartable
j_n | Patch-normal current density [A/m^2]
V_p^n | Electric potential on film-fluid interface [volt = kg m^2/(A s^3)]
V_p^o | Previous time-step electric potential on the interface [volt]
V_{film} | Electric potential due to film resistance [volt]
V_{body} | Electric potential due to body resistance [volt]
V_i | Initial electric potential [volt]
R_\Delta| Film resistance (finite increment) [ohm m^2 = kg m^4/(A^2 s^3)]
R_{body} | Body resistance [ohm m^2 = kg m^4/(A^2 s^3)]
\rho | Isotropic film resistivity [ohm m = kg m^3/(A^2 s^3)]
h | Film thickness [m]
C_{eff} | Volumetric Coulombic efficiency [m^3/(A s)]
j_{min} | Minimum current density for deposition onset [A/m^2]
\sigma | Isotropic conductivity of mixture [S/m = A^2 s^3/(kg m^3)]
\vec{n} | Patch-normal unit vector [-]
\endvartable
Usage
Example of the boundary condition specification:
\verbatim
{
// Mandatory entries
type electrostaticDeposition;
h ;
CoulombicEfficiency ;
resistivity ;
// Conditional mandatory entries
// Option-1: single-phase
sigma ;
// Option-2: multiphase
phases
{
alpha.air
{
sigma ;
}
alpha.water
{
sigma ;
}
alpha.mercury
{
sigma ;
}
...
}
// Optional entries
jMin ;
qMin ;
Rbody ;
Vi ;
Vanode ;
qCumulative ;
// Inherited entries
...
}
\endverbatim
where the entries mean:
\table
Property | Description | Type | Reqd | Deflt
type | Type name: electrostaticDeposition | word | yes | -
h | Film thickness | scalarField | yes | -
CoulombicEfficiency | Coulombic efficiency | PatchFunction1\ | yes | -
resistivity | Isotropic film resistivity | PatchFunction1\ | yes | -
sigma | Isotropic electrical conductivity of phase | scalar | yes | -
jMin | Minimum current density for deposition onset | scalar | no | 0
qMin | Minimum accumulative specific charge for deposition onset | scalar | no | 0
Rbody | Resistance due to main body and/or pretreatment layers | scalar | no | 0
Vi | Initial electric potential | scalar | no | 0
Vanode | Anode electric potential | scalar | no | GREAT
qCumulative | Accumulative specific charge [A s/m^2] | scalarField | no | 0
\endtable
The inherited entries are elaborated in:
- \link fixedValueFvPatchFields.H \endlink
- \link PatchFunction1.H \endlink
Note
- Depletion or abrasion of material due to negative current is not allowed.
- When accumulative specific charge (\c qCumulative) is less than minimum
accumulative specific charge (\c qMin), no deposition occurs.
- Boundary-condition updates are not allowed during outer corrections
to prevent spurious accumulation of film thickness.
- \c resistivity, \c jMin, \c qMin and \c Rbody are always non-negative.
SourceFiles
electrostaticDepositionFvPatchScalarField.C
\*---------------------------------------------------------------------------*/
#ifndef electrostaticDepositionFvPatchScalarField_H
#define electrostaticDepositionFvPatchScalarField_H
#include "fixedValueFvPatchFields.H"
#include "Enum.H"
#include "PatchFunction1.H"
// * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * //
namespace Foam
{
/*---------------------------------------------------------------------------*\
Class electrostaticDepositionFvPatchScalarField Declaration
\*---------------------------------------------------------------------------*/
class electrostaticDepositionFvPatchScalarField
:
public fixedValueFvPatchScalarField
{
// Private Data
//- Film thickness
scalarField h_;
//- Accumulative specific charge
scalarField qcum_;
//- Electric potential due to film resistance
scalarField Vfilm_;
//- Coulombic efficiency
autoPtr> Ceffptr_;
//- Isotropic film resistivity
autoPtr> rptr_;
//- Minimum current density for the deposition onset
scalar jMin_;
//- Minimum accumulative specific charge for the deposition onset
scalar qMin_;
//- Resistance due to main body and/or pretreatment layers
scalar Rbody_;
//- Initial electric potential
scalar Vi_;
//- Anode electric potential
scalar Vanode_;
// Isotropic electrical conductivitiy properties
//- Dictionary of phase data
dictionary phasesDict_;
//- List of phase names
wordList phaseNames_;
//- Unallocated list of phase fields
UPtrList phases_;
//- List of isotropic electrical conductivity of phases
PtrList sigmas_;
//- Isotropic electrical conductivity of a single phase
dimensionedScalar sigma_;
//- Time index - used to prevent film accumulation during outer iters
label timei_;
//- Master patch ID
mutable label master_;
// Private Member Functions
//- Return non-const access to an electrostaticDeposition patch
electrostaticDepositionFvPatchScalarField& eVPatch
(
const label patchi
) const;
//- Return non-const access to the master patch ID
label& master() noexcept
{
return master_;
}
//- Set master patch ID
void setMaster() const;
//- Round scalars of a given scalar field to dcml points decimal
void round(scalarField& fld, const scalar dcml=1e8) const;
//- Write film thickness field to facilitate postprocessing
void writeFilmFields() const;
public:
//- Runtime type information
TypeName("electrostaticDeposition");
// Constructors
//- Construct from patch and internal field
electrostaticDepositionFvPatchScalarField
(
const fvPatch&,
const DimensionedField&
);
//- Construct from patch, internal field and dictionary
electrostaticDepositionFvPatchScalarField
(
const fvPatch&,
const DimensionedField&,
const dictionary&
);
//- Construct by mapping given
//- electrostaticDepositionFvPatchScalarField onto a new patch
electrostaticDepositionFvPatchScalarField
(
const electrostaticDepositionFvPatchScalarField&,
const fvPatch&,
const DimensionedField&,
const fvPatchFieldMapper&
);
//- Construct as copy
electrostaticDepositionFvPatchScalarField
(
const electrostaticDepositionFvPatchScalarField&
);
//- Construct as copy setting internal field reference
electrostaticDepositionFvPatchScalarField
(
const electrostaticDepositionFvPatchScalarField&,
const DimensionedField&
);
//- Return a clone
virtual tmp> clone() const
{
return fvPatchField::Clone(*this);
}
//- Clone with an internal field reference
virtual tmp> clone
(
const DimensionedField& iF
) const
{
return fvPatchField::Clone(*this, iF);
}
// Member Functions
// Access
//- Return const access to film thickness patch field
const scalarField& h() const noexcept
{
return h_;
}
// Mapping
//- Map (and resize as needed) from self given a mapping object
virtual void autoMap
(
const fvPatchFieldMapper&
);
//- Reverse map the given fvPatchField onto this fvPatchField
virtual void rmap
(
const fvPatchScalarField&,
const labelList&
);
// Evaluation
//- Return the isotropic electrical conductivity field of mixture
tmp sigma() const;
//- Update the coefficients associated with the patch field
virtual void updateCoeffs();
// I-O
//- Write
virtual void write(Ostream&) const;
};
// * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * //
} // End namespace Foam
// * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * //
#endif
// ************************************************************************* //